These 3mm silicon disks have a 50nm ultra low stress silicon nitride layer (Si3N4) on both sides and can be used as specimen disks for AFM applications which need a Si3N4 background. Provide smooth background: Surface roughness has RMS (Rg) of 0.65 ±0.06nm which gives a mean roughness (RA) of 0.45 ±0.02nm
Film thickness: 50nm ultra low stress Si3N4 on both sides
Disc thickness: 200µm silicon support
Disc diameter: 3mm
Surface roughness: The RMS (Rq) is 0.65 +/- 0.06nm which gives a mean roughness (Ra) of 0.45 +/- 0.02nm
Packaging: The PELCO® Silicon Aperture Frames are packaged under cleanroom conditions in the PELCO® #160 TEM Grid Storage box. Each box holds 10 discs.
