"Critical Dimension (CD) structures" are particularly useful for SEM / FIB magnification calibration and may be used for AFM.
Microscopists and engineers using high performance SEMs or FIB systems will find this calibration test specimen useful. The 4.8 x 4.8mm silicon standard has a series of patterns with a side length of 480µm around its edges, helpful for orientation. There are three versions available.
Version with a 10-5-2-1-0.5um structure
This CD calibration test specimen comprises 5 line patterns, each one clearly identified by its pitch. Each pattern has five bars and spaces of equal pitch:10.0um, 5.0µm, 2.0µm, 1.0µm and 0.5µm. The central line area may be used for AFM measurements. The patterns are etched into Si with a depth of approximately 200nm. There is no coating on the Si surface.
Two types are offered:
- certified by PTB (Physikalische Technische Bundesanstalt - German counter part of NIST)
and individually numbered.
Based on the measurement of 9 different standards, the accuracy and uniformity are:
This advanced CD calibration test specimen is suited for calibrating smaller structures. The 500-200-100nm test specimen comprises 3 line patterns, each identified by its pitch. Each pattern has 5 bars and spaces with equal pitch: 500nm, 200nm and 100nm. The central area may be used for AFM measurements. The patterns are etched into Si with a depth of approx. 45-50nm. There is no coating on the Si surface. On some CD calibration targets one of the 100nm lines can be missing. This is a normal occurrence and does not influence performance of the specimen. see mount selections, types A-Q